1887
PDF

Abstract

Gas is being developed from the Lower Cambrian Amin Formation at depths of over 4,000 m (true vertical depth sub-sea) in northern Oman. Development drilling in some of the fields has been hampered by well stability problems in the overburden, as well as in the reservoir sections. An extensive data gathering (including timelapse calliper) and geomechanical analysis program was executed to understand the mechanism that control well stability. The derived geomechanical model for a specific northern Omani field confirmed a present-day stress environment with high horizontal compression (in excess of the overburden) as seen elsewhere in northern Oman. In addition, stress orientation and magnitudes appear to vary somewhat across the field, probably due to the proximity of a major active fault zone close to the field. These ambient stress conditions strongly influence wellbore stability during drilling. Five major well failure mechanisms were identified: (1) clay stability, (2) rock matrix failure, (3) fault-related failure, (4) fracture-related losses, and (5) fracture-related rock failure. Time-lapse caliper logs indicated that rock-matrix failure occurs rapidly, after which the borehole becomes stable for at least two months. Utilizing this information, upper and lower mud-window bounds for future vertical development wells were calculated. Subsequently, optimal mud-weight plans for different hole sections, including mediation plans for the various failure mechanisms, were developed. Following the implementation of the study results, together with further optimisation initiatives, significant gains on well-delivery times have been made by up to 50%.

Loading

Article metrics loading...

/content/papers/10.3997/2214-4609-pdb.246.135
2008-01-03
2024-04-26
Loading full text...

Full text loading...

http://instance.metastore.ingenta.com/content/papers/10.3997/2214-4609-pdb.246.135
Loading
This is a required field
Please enter a valid email address
Approval was a Success
Invalid data
An Error Occurred
Approval was partially successful, following selected items could not be processed due to error